Advanced Lithography

This book presents state-of-the-art information regarding the extensive field of advanced lithography. Advanced lithography expands into numerous sub-fields like micro electro-mechanical system (MEMS) nano-lithography nano-physics etc. In optimized electron device nano-lithography reaches up to 20 nm in size. Subsequently we have to analyze and develop true single nanometer size lithography. One of the solutions is to analyze a fusion of bottom up and top down technologies like EB drawing and self-assembly with block copolymer. In nano-photonics and MEMS 3D structures are required for carrying out specific functions in the devices for applications. They are formed as a result of execution of numerous techniques like stereo-lithography sputtering colloid lithography deposition dry etching etc. This book provides the readers with valuable information about nano structure 3D structure nano-lithography and elucidates the methodology techniques and applications of nano-lithography.