This book presents a groundbreaking Dual Metal Double Gate Tunnel Field Effect Transistor (DM DG TFET) featuring a laterally divided dielectric gate oxide structure with a tunneling and auxiliary gate. By engineering gate oxides and work functions the device achieves a sub-threshold swing below 90 mV/decade high current ratio and ultra-low OFF current. It explores the role of high-k dielectrics doping and gate potentials in optimizing performance. The research further introduces a charge plasma-based TFET for label-free biomolecule detection demonstrating exceptional drain sensitivity and RF response. A Heterojunction Ferroelectric Charge Plasma TFET design enhances switching speed and biosensing accuracy. Bridging innovation with simulation this work establishes TFETs as key components for next-generation electronics and biosensing technologies.
Piracy-free
Assured Quality
Secure Transactions
Delivery Options
Please enter pincode to check delivery time.
*COD & Shipping Charges may apply on certain items.