Chemical Processing of Dielectrics Insulators and Electronic Ceramics

This book focuses on the creative use of chemistry in the fabrication of a variety of oxide and non-oxide materials which are likely to play a crucial role in the development of the next generation of microelectronics devices. It includes inorganic precursor chemistry gas-phase and solid-state chemistry materials science chemical physics and chemical engineering. Highlights include the deposition of high-k dielectric gate oxides ferroelectric oxide films for infrared and memory applications low-k dielectrics TiN and TaN diffusion barriers and fresh precursors for III-V nitrides. The emphasis is on chemical methods for the controlled deposition of thin films for which chemical vapor deposition (CVD) has proven to be a useful and versatile technique. Of particular interest is the use of liquid-injection MOCVD for the deposition of oxide multilayers and superlattices. Solution deposition techniques such as sol-gel metalorganic decomposition (MOD) hydrothermal processing are also prominently featured. Topics include: CVD of oxide ceramics; CVD of nonoxide ceramics; solution deposition of electronic ceramics; alternative chemical processing methods and characterization of electronic ceramics..