Microlithography

<p>The completely revised Third Edition to the bestselling <i>Microlithography: Science and Technology</i> provides a balanced treatment of theoretical and operational considerations from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging materials and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical deep-ultraviolet (DUV) immersion multiple patterning extreme ultraviolet (EUV) maskless nanoimprint and directed self-assembly lithography together with comprehensive descriptions of the advanced materials and processes involved.</p><p>New in the Third Edition</p><p>In addition to the full revision of existing chapters this new Third Edition features coverage of the technologies that have emerged over the past several years including multiple patterning lithography design for manufacturing design process technology co-optimization maskless lithography and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies systems materials and processes for optical UV DUV immersion and EUV lithography.</p><p>The Third Edition of <i>Microlithography: Science and Technology</i> authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition.</p><p>Loaded with illustrations equations tables and time-saving references to the most current technology this book is the most comprehensive and reliable source for anyone from student to seasoned professional looking to better understand the complex world of microlithography science and technology.</p>