Particle Control for Semiconductor Manufacturing

There is something Alice-in-Wonderlandish about powerful and vital computer systems being shut down by a microscopic mote that a hay-feverist wouldn't sneeze at, but as computer chips get smaller, smaller and smaller particles on their surface have a larger and larger effect on their performance. In <p>1: Particle Interaction with Integrated Circuits, 2: Introduction to Particle Science, 3: Particle Size Distributions, 4: Light Scattering Theory, 5: Developing Trust in Particle Counters, 6: Ultrafine (< 0.1 ?m Diameter) Particles, 7: Particle Control Methods: I, 8: Predicted and Measured Clean-Room Contamination, 9: The Dynamics of Aerosols in Clean-Room Environments: Implications for Monitoring and Control of Airborne Particles and Their Sources, 10: Measurement and Minimization of Particles in Process Gases, 11: Particles in Process Liquids, 12: The Immersion Wet Process System, 13: Measurement of Particles from Equipment and Processes: the Particles-per-Wafer-per-Pass (PWP) Method, 14: Measurement of Particle Emission Rates from Equipment, 15: Survey of Process-Induced Defects, 16: Particle Control Methods: II, 17: Clean Equipment Design Rules and the SMIF Isolation Concept, 18: Airflow Modeling and Particle Control by Vertical Laminar Flow, 19: Particle Deposition Data: Room Air Ionization as a Control Method, 20: Particle Identification, 21: Particle Adhesion to Surfaces: Theory of Cleaning, 22: Experimental Evaluation of Cleaning Techniques, 23: Wafer Cleaning: Present and Future, 24: Equipment Cleaning to Minimize Particle Deposition, 25: Review of FED-STD-209D, 26: Methods of Circuit Defectivity Analysis, lndex</p>