English
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About The Book
Description
Author(s)
Self-contained book providing an up-to-date description of plasma etching and deposition in semiconductor fabrication. Presents the basic physics and chemistry of these processes and shows how they can be accurately modelled. Suitable as a graduate-level textbook and will also be a useful reference for practising engineers in the semiconductor industry.
Piracy-free
Assured Quality
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Delivery Options
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*COD & Shipping Charges may apply on certain items.
Review final details at checkout.
Details
ISBN 13
9780521018005
Publication Date
-29-09-2005
Pages
-232
Weight
-417 grams
Dimensions
-178x254x12.42 mm
